化学气相沉积高纯钨的择优取向与性能研究

Research on Texture and Mechanical Performance of High-Purity CVD Tungsten

利用光学显微镜、X射线衍射(XRD)和扫描电子显微镜的电子背散射衍射花样(electronic backscatter ring diffraction,EBSD),对用化学气相沉积制备的高纯钨进行了微观结构和晶面取向分析;利用霍普金森压杆系统和电子万能试验机测试了高纯钨的动态和准静态力学性能。研究表明:化学气相沉积高纯钨具有柱状晶组织,并且具有明显的(100)择优取向;动态屈服强度达到2000MPa以上,静态屈服强度约为1350MPa,具有应变速率敏感性。

The microstructure and grain orientation of the high-purity tungsten prepared by a CVD method（CVD-W） were analyzed by optical microscope（OM）,X-ray diffraction（XRD） and electron backscatter ring diffraction（EBSD） in a scanning electron microscopy（SEM）.The dynamic and static mechanical performances were tested by Hopkinson split-bar and electron testing machinery.Results show that the CVD-W is of columnar-grain microstructure and has（100） texture.The dynamic yield strength of the CVD-W is above 2000 MPa,and the static yield strength is about 1350 MPa.CVD-W has strain-rate sensitivity.