摘要
A simple method is introduced for the preparation of large-area films of molybdenum trioxide （MoO3） microbelts. It is found that such films can be grown on indium tin oxide （ITO） glasses or silicon substrates at low temperatures by thermal evaporation deposition in air without using catalyst. Field emission measurements show that the turn-on field of the MoO3 microbelts is as low as 2.2 V/μm required to obtain a current density of 10 μA/cm^2, The combination of the simplicity of the growth method and the attractive field emission performance makes it a potential low-cost technique for the preparation of large-area field emission cold cathode material.
A simple method is introduced for the preparation of large-area films of molybdenum trioxide （MoO3） microbelts. It is found that such films can be grown on indium tin oxide （ITO） glasses or silicon substrates at low temperatures by thermal evaporation deposition in air without using catalyst. Field emission measurements show that the turn-on field of the MoO3 microbelts is as low as 2.2 V/μm required to obtain a current density of 10 μA/cm^2, The combination of the simplicity of the growth method and the attractive field emission performance makes it a potential low-cost technique for the preparation of large-area field emission cold cathode material.
基金
support of the project from the National Natural Sci-ence Foundation of China(Nos.U0634002,50725206,60571035and50672135)
the National Basic ResearchProgram of China(Nos.2003CB314701,2007CB935501and2008AA03A314),the Science and Technology Depart-ment of Guangdong Province,and the Department of Informa-tion Industry of Guangdong Province,and the Science and Technology Department of Guangzhou City
