HFCVD生长金刚石薄膜中气体状态参数空间场模拟计算

THE SIMULATION OF THE SPACE FIELDS OF GAS PHYSICAL PARAMETERS DURING HFCVD DIAMOND FILMS

本文对HFCVD过程中的气体状态参数空间场进行了模拟计算．结果表明，气体的温度，体密度，速度和质量流密度场是空间位置的函数，在合适的位置，可获得均匀的温度和质量流密度．这些结果可为制备大面积均匀金刚石薄膜时的工艺参数选择提供理论依据．

The space field of gas physical parameters was simulated during the hot-filament chemicalvapor deposition of diamond films. The results showed that the temperature, volume density, velocity andmass flow density of gas varied as space function in chamber and nearly uniform temperature and massflow density of gas existed in certain space. The results also provide a basis for selecting the technologicalparameters to Obtain uniform diamond films over a large area.