双咪唑光敏引发体系在可见光胶印PS版中的应用

The Applicaiton of Visible Light Offset PS Plate withBiimidazole Photosensitive System

本文选取三种不同的光敏剂，与光引发剂六芳基双咪唑相复合，构成了四种可见光光敏引发体系。我们将三种可见光光敏引发体系应用于可见光胶印ＰＳ版的研究中，通过曝光实验，得到了制备可见光胶印ＰＳ版的初步条件，为以后的激光直接制版材料的研究打下基础。

In this paper,four visible light photosensitive systems were composed of three sensitizers with hexaarylbiimidazole.These photosensitive systems were applied in visible light offset PS plate.Through expose experiment,we got the prime condition of visible light offset PS plate.These work can be used to study the materials of laser computer to plate.