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Ar/N_2气体比例对ZrN/WTiN纳米多层膜的影响

Influence of Ar/N_2 flow rate on nanoscale ZrN/WTiN multilayered coatings
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摘要 选择ZrN和WTi N作为个体层材料,利用超高真空射频磁控溅射系统制备ZrN,WTi N和一系列的ZrN/WTi N纳米多层薄膜.通过X射线衍射仪(XRD)和纳米力学测试系统分析制备参数中Ar/N2气体比例对多层膜结构与机械性能的影响.结果表明:多层膜的纳米硬度值普遍高于2种个体材料混合相的硬度值;当FAr∶FN2=5时,ZrN/WTi N纳米多层薄膜出现了ZrN(111),Ti N(111)衍射峰和非晶态,多层膜体系的硬度、应力和弹性模量均达到最佳效果. The deposition of ZrN/WTiN multilayered coatings with nanoscale bilayer period by R.F.magnetron sputtering is reported.X-ray diffraction and nanoindention are employed to investigate the influence of Ar/N2 flow rate on microstructure,mechanical properties of the nanoscale multilayers.The results show that all multilayered coatings almost reveal higher nanohardness than the rule-of-mixtures value of monolithic ZrN and WTiN coatings.At FAr∶FN2=5,XRD patterns show that ZrN/WTiN multilayered coatings obtain mixed polycrystalline textures of ZrN（111）,TiN（111）,and amorphous structure.The multilayered coatings at this condition possess excellent hardness,internal stress and elastic modulus compared to those synthesized at other Ar/N2 flow rates.
作者 王明霞 李德军
机构地区 天津师范大学物理与电子信息学院
出处 《天津师范大学学报（自然科学版）》 CAS 北大核心 2010年第3期31-34,共4页 Journal of Tianjin Normal University：Natural Science Edition
基金 国家自然科学基金资助项目(50872094) 天津市科技计划国际合作项目(07ZCGHHZ01500) 天津师范大学青年科研基金资助项目(52LJ73)
关键词 射频磁控溅射 ZrN/WTiN多层膜 Ar/N2气体比例 R.F.magnetron sputtering ZrN/WTiN multilayered coatings Ar/N2 flow rate
分类号 TG174.444 [金属学及工艺—金属表面处理]
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参考文献12

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共引文献39

天津师范大学学报（自然科学版）
2010年 第3期

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