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电子束蒸发沉积金属-TiO_2薄膜的结构和光学性质 被引量:3

Structure and Optical Properties of Metal Doped TiO_2 Thin Films Deposited by Electron Beam Evaporation
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摘要 采用电子束蒸发法在玻璃基底上制备了TiO2薄膜及Fe、Cu、Al掺杂TiO2膜,通过XRD、Raman光谱、XPS及AFM等测试手段研究了TiO2膜及金属-TiO2掺杂膜的结构、组成和形貌。金属掺杂量为1%,退火温度为773 K时,沉积得到的薄膜均为锐钛矿晶体结构的TiO2,掺杂金属的种类对薄膜的晶粒尺寸有一定的影响。采用紫外-可见分光光度计测试薄膜的吸收光谱,掺杂后TiO2的吸收带边发生改变,薄膜对可见光的吸收明显加强。光催化降解甲基橙实验表明,制备的TiO2薄膜及其金属掺杂膜具有一定的光催化活性,且Fe-TiO2膜的降解效率较高。 The titanium dioxide(TiO2) thin film and Fe,Cu,Al-doped TiO2 films are prepared by electron beam evaporation on glass substrates.The crystal structures,compositions and surface micrographs of films are studied by means of X-ray diffraction(XRD),Raman spectrum,X-ray photo-electron spectroscopy(XPS) and atomic force microscopy(AFM).The results show that the anatase phase films obtained at doping content of 1% and annealing temperature of 773 K are mainly composed of TiO2.The grain size of films changes obviously as the doped metal ion varies.The optical properties of metal-TiO2 films are analyzed by ultraviolet-visible(UV-Vis) spectral,and the optical band gap of Fe,Cu,Al-TiO2 films narrow from 3.24 eV of TiO2 thin films to 2.98 eV,3.10 eV,3.18 eV respectively.The degradation of methyl orange shows that TiO2 films and metal-TiO2 films possess photocatalytic activity and Fe-TiO2 film has higher degradation efficiency.
出处 《南京理工大学学报》 EI CAS CSCD 北大核心 2010年第4期547-552,共6页 Journal of Nanjing University of Science and Technology
基金 科技部中白政府间科技合作项目(CB08-9) 南京市科技发展计划项目(200901061)
关键词 TIO2薄膜 锐钛矿 电子束蒸发 金属掺杂 禁带宽度 光催化 titanium dioxide films anatase electron beam evaporation metal-doping band gap photocatalysis
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