基于激光加工和自组装技术硅基底超疏水表面的制备

Preparation of superhydrophobic surface on silicon based on laser manufacturing and self-assembled technique

利用激光在硅基底上加工具有规则点阵结构的表面纹理,采用自组装技术在此硅表面制备全氟辛烷基三氯硅烷自组装分子膜。采用扫描电子显微镜和表面形貌仪对硅试样表面进行形貌分析,采用接触角测量仪测量试样的接触角。结果表明,激光加工后的硅试样表面纹理深度和表面粗糙度均随激光加工间距的增加而逐渐变大,试样表面的去除量随光照时间的增加而增大。通过激光加工和沉积自组装分子膜,硅试样表面的水接触角显著增大,最大可达到156°,且试样的水接触角随激光加工间距的减少而增大。试样接触角测量值与Cassie模型预测值相一致,当点阵直径与加工间距比<0.510时,硅试样表面为超疏水表面。

Silicon substrate were processed into regular surface texture with lattice structure by laser manufacturing. Self-assembled monolayers of perfluorooctyltrichloroslane were prepared on texturing surface by self-assembled method. Scanning electron microscope and surface profiler were used to analyse the surface properties of specimen. The characterization of the contact angle were conducted by contact angle measurement. The results indicate that depth of the texturing surface and surface roughness increase with pitch increasing after laser manufacturing. The volume loss of specimen surface increase with irradiation time increasing. After laser manufacturing and self-assembled monolayers preparation, the contact angles of the water droplet on the substrates increase significantly. The maximum contact angle reached 156°, and the contact angles increase with pitch decreasing. The values of contact angle measurement are in accord with the Cassie model’s prediction. It＇s in superhydrophobic state when the ratio of diameter and pitch is less than 0.510.