基于磁控溅射的金属氧化物气敏薄膜的研究进展

Progress of gas-sensing metal oxide thin films prepared by magnetron sputtering process

气体传感器的应用越来越广泛,对气敏材料的研究也越来越深入。磁控溅射法是生产气敏薄膜的一种主要方法,本文重点介绍了用磁控溅射法制备的几种金属氧化物薄膜(SnO2、WO3、ZnO、TiO2、In2O3和NiO等)的气敏性能及其研究进展,对其它薄膜做了简要概述,并提出了目前在气敏薄膜研究中存在的问题。

Gas sensors are becoming more and more attractive in various fields,thus resulting in the in-depth study on the gas-sensing materials.In this respect,the magnetron sputtering process is of importance to the production of gas-sensing thin films.The gas sensibilities of several metal oxide thin films deposited by magnetron sputtering,such as SnO2,WO3,ZnO,TiO2,In2O3 and NiO films,and the progress in the studies on them are summarized with other films discussed briefly.And the existing problems in RD of gas-sensing thin films are proposed.