磁控溅射制备非晶态WO_3薄膜的光催化性能

Photocatalytic properties of amorphous WO_3 thin films grown by magnetron sputtering

采用射频反应磁控溅射工艺在玻璃基片上沉积了非晶态WO3薄膜。通过光催化降解亚甲基蓝和罗丹明B溶液实验,研究了所制WO3薄膜的光催化活性和使用寿命。X射线衍射(XRD)分析表明:所制备的WO3薄膜为非晶态。光催化实验表明:紫外光照3h后,薄膜对亚甲基蓝和罗丹明B溶液的最大降解率分别为83.26%和72.73%。重复使用3次后,薄膜对亚甲基蓝的降解率保持在75%以上,7次使用后薄膜基本丧失光催化活性。采用去离子水超声处理30min的方法可使已失活薄膜对亚甲基蓝的降解率从20%恢复至81%。

WO3 films were deposited on glass substrates by reactive magnetron sputtering,their catalytic activity and service life were studied via photodegradation for methylene blue and rhodamine B solutions. Experimental results showed that the prepared WO3 films are amorphous as characterized by X-ray diffraction（XRD）. Being irradiated for 3 h by ultraviolet light,the maximum degradation rate of methylene blue and rhodamine B solutions were 83.36% and 72.73% , respectively. The photodegradation rate of methylene blue remained at 75% after reused for three times of the WO3 films. The photocatalytic activity of the WO3 films almost disappeared after using for seven times. The deactivated WO3 films could be regenerated by ultrasonic treatment in deionized water for 30 min,with which the photodegradation rate of methylene blue could be improved from 20% to 81%.