并行模拟退火算法优化衍射光学元件设计

Optimize Design of Diffractive Optics Elements by Parallel Simulated Annealing

模拟退火(SA)是解决复杂非线性优化问题的好工具,开发其并行性也成为近些年的研究热点和方向。针对衍射光学元件(DOE)的束匀滑应用,结合消息传递接口(MPI)并行编程方法,开发并实现了具有良好收敛效果和并行效率的SA算法。在8个中央处理器(CPU)的小型并行计算平台上进行了入射口径310mm、出射20阶超高斯0.4mm×0.8mm聚焦光斑的优化设计,使用不到原来1/6的时间就能获得比原串行算法更好的匀滑效果,从而验证了该并行SA算法的快速有效性。

Simulated annealing （SA） is a good tool for solving complex nonlinear optimization problem. The development of its parallelism has become the study focus in recent years. An efficient and convergent parallel simulated annealing （PSA） combined with message passing interface （MPI） method is presented for the optimization of diffractive optics elements （DOE）. Using an 8-CPU parallel computing platform, optimization designs are performed with incident caliber of 310 mm and 20-order super-Gaussian focal spot of 0.4 mm×0.8 mm. The results show that the smoothing effect with the PSA method can be better and the time-cost is less than 1/6 than those with serial SA method, which demonstrates the quickness and effectiveness of the PSA.