溅射条件对SiO_2膜力学特性的影响

Effect of sputtering conditions on dynamic property of SiO2 thin film

介绍了在不锈钢衬底和Ｎｉ－Ｃｒ应变电阻间ＳｉＯ２薄膜的制做方法，在不宜用热氧化和ＣＶＤ法制做ＳｉＯ２膜的情况下，利用该法是行之有效的．探讨了溅射工艺条件对膜附着力和应力的影响，并指出了制备具有较好附着力和较低应力的方法．

This paper introduce the fabrication of SiO2 thin film between the stainless steel substrateand Ni - Cr strain resistance, annlyses the effect of sputtering conditions on the thin film adhe-and proposes the way to make the thin film with good adhesion and the strain sion and little strainThe method is a very effective on the condition that the ways of heat oxidation and CVD are notappropriate during the fabrication of SiO2 film.