摘要
介绍了在不锈钢衬底和Ni-Cr应变电阻间SiO2薄膜的制做方法,在不宜用热氧化和CVD法制做SiO2膜的情况下,利用该法是行之有效的.探讨了溅射工艺条件对膜附着力和应力的影响,并指出了制备具有较好附着力和较低应力的方法.
This paper introduce the fabrication of SiO2 thin film between the stainless steel substrateand Ni - Cr strain resistance, annlyses the effect of sputtering conditions on the thin film adhe-and proposes the way to make the thin film with good adhesion and the strain sion and little strainThe method is a very effective on the condition that the ways of heat oxidation and CVD are notappropriate during the fabrication of SiO2 film.
出处
《沈阳工业大学学报》
EI
CAS
1999年第3期204-206,共3页
Journal of Shenyang University of Technology