模拟计算低能重离子注入彩棉种子的深度

Simulation of Penetration Range Distribution of Ion Beam with Low Energy Implanted in Colored Cotton Seeds

采用蒙特卡罗方法,模拟计算了20keVTi+注入彩棉种子的深度-浓度分布。核碰撞能量损失采用经典的两体碰撞理论,电子能量损失用Lindhard-Scharff公式,计算得到Ti+在彩棉种子中的最可几深度是6.66μm,与实验结果非常接近。表明理论模型建立相对合理,为研究低能重离子与生物体之间的相互提供了理论基础。

The depth and density distribution of 20 keV Ti＋ implanted into colored cotton seeds is simulated by the Monte Carlo method.The energy loss of incident ions due to nuclear scattering is calculated by using binary collision approximation,and the electronic energy loss is calculated by Lindhard-Scharff formulation.On the basis of some theoretical considerations of the target material,the most probable depth of 20 keV Ti＋ implanted into colored cotton seeds is calculated to be 6.66 μm,which agrees with experimental results.This indicates that the model is appropriate to calculate the depth and density distribution of the low energy ions implanted in plant seeds.