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CVD金刚石薄膜中内应力张/压性质预测的研究 被引量:1

Study On The Prediction Of Tensile/Compressive Internal Stress In CVD Diamond Films
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摘要 对大量实验测量出的甲烷浓度和衬底温度分别在单因素变化时,金刚石薄膜内应力的变化规律进行了归纳。在此基础上,利用材料科学中相图的思想,对任意给定的甲烷浓度和衬底温度条件下制备的金刚石膜中内应力处于张应力还是压应力的情况进行了分析,绘制出金刚石膜的“内应力状态图”。结果表明:利用“内应力状态图”可以预测内应力的张/压性质,预测分析结果与实验结果一致。 An “internal stress state diagram” for describing the dependence of internal stress state (tensile or compressive) in polycrystalline diamond thin films upon the methane concentration and substrate temperature is proposed, from which the optimal technological condition for preparing the diamond films with zero or minimal internal stress could be predicted. The preliminary experimental results are in good agreement with the prediction.
出处 《重庆大学学报(自然科学版)》 EI CAS CSCD 1999年第3期112-116,共5页 Journal of Chongqing University
基金 国家自然科学基金
关键词 金刚石 薄膜 内应力 张/压性质 CVD 预测 diamond Films chemical vapour deposition internal stress
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