期刊文献+

Novel multi-bit non-uniform channel charge trapping memory device with virtual-source NAND flash array

Novel multi-bit non-uniform channel charge trapping memory device with virtual-source NAND flash array
原文传递
导出
摘要 In order to overcome the bit-to-bit interference of the traditional multi-level NAND type device, this paper firstly proposes a novel multi-bit non-uniform channel charge trapping memory (NUC-CTM) device with virtual-source NAND-type array architecture, which can effectively restrain the second-bit effect (SBE) and provide 3-bit per cell capability. Owing to the n- buffer region, the SBE induced threshold voltage window shift can be reduced to less than 400 mV and the minimum threshold voltage window between neighboring levels is larger than 750 mV for reliable 3-bit operation. A silicon-rich SiON is also investigated as a trapping layer to improve the retention reliability of the NUC-CTM. In order to overcome the bit-to-bit interference of the traditional multi-level NAND type device, this paper firstly proposes a novel multi-bit non-uniform channel charge trapping memory (NUC-CTM) device with virtual-source NAND-type array architecture, which can effectively restrain the second-bit effect (SBE) and provide 3-bit per cell capability. Owing to the n- buffer region, the SBE induced threshold voltage window shift can be reduced to less than 400 mV and the minimum threshold voltage window between neighboring levels is larger than 750 mV for reliable 3-bit operation. A silicon-rich SiON is also investigated as a trapping layer to improve the retention reliability of the NUC-CTM.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第10期57-61,共5页 半导体学报(英文版)
基金 Project supported by the National Basic Research Program of China(No.2006CB302700)
关键词 multi-bit storage non-uniform channel charge trapping memory NAND array SiON layer multi-bit storage non-uniform channel charge trapping memory NAND array SiON layer
  • 相关文献

参考文献12

  • 1Sanvido M, Chu F R, Kulkami A, et al. Nand flash memory and its role in storage architectures. Proc IEEE, 2008, 96(1): 1864.
  • 2Jung T S, Choi Y J, Suh K D, et al. A 3.3 V 128 Mb multi-level NAND flash memory for mass storage applications. ISSCC Tech Dig, 1996:32.
  • 3White M H, Adams D A, Bu J, et al. On the Go with SONOS. IEEE Circuits and Devices Magazine, 2000, 16:22.
  • 4International Technology Roadmap for Semiconductors (ITRS), 2007.
  • 5Eitan B, Pavan P, Bloom I, et al. NROM: a novel localized trapping, 2-bit nonvolatile memory cell. IEEE Electron Device Lett, 2000, 21:543.
  • 6Eitan B, Cohen G, Shappir A, et al. 4-bit per cell NROM reliability. IEDM Tech Dig, 2005:539.
  • 7Chang Y W, Lu T C, Pan S, et al. Modeling of second-bit effect of a nitride based trapping storage flash EEPROM cell under two-bit operation. IEEE Electron Device Lett, 2004, 25:95.
  • 8Lue H T, Hsu T H, Wu M T, et al. Studies of the reverse read method and second-bit effect of 2-bit/cell nitride-trapping device by quasi-two-dimensional model. IEEE Trans Electron Devices, 2006, 53:119.
  • 9Yeh C C, Tsai W J, Liu M I, et al. PHINES: a novel low power program/erase, small pitch, 2-bit per cell flash memory. IEDM Tech Dig, 2002:931.
  • 10Datta A, Kumar P B, Mahapatra S. Dual-bit/cell SONOS flash EEPROMs: impact of channel engineering on programming speed and bit coupling effect. IEEE Electron Device Lett, 2007, 28(5): 446.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部