摘要
就氢氧化铁对As（Ⅲ）的吸附动力学、吸附等温线以及pH和温度等影响因素进行了研究。结果表明：氢氧化铁对As（BI）的吸附动力学符合Lagergren二级吸附动力学模型，其吸附等温线可用Langmuir方程很好地描述，即属于单分子层吸附，试验得到的饱和吸附量为9．09mg／g；pH值在4．1～8．5内，氢氧化铁对As（Ⅲ）的去除率较高，保持在70％以上，超出这个范围，氢氧化铁对As（Ⅲ）的去除率逐渐降低，pH值为6．8左右时，氢氧化铁对As（III）的去除率达到最高，约为94．8％；随着温度的升高，氢氧化铁对As（Ⅲ）的吸附率逐渐降低，在0～25℃时，氢氧化铁对As（Ⅲ）的去除率保持在80％以上。
The adsorption of As （Ⅲ） using ferric hydroxide was investigated, concerning with the adsorption kinetics, adsorption isotherm, influencing factors of pH and temperature. The result showed that the adsorption of As （Ⅲ） by ferric hydroxide conformed to the second order Langmuir adsorption kinetic model, the adsorption isotherm could be well described with the Langmuir equation, this kind of adsorption was single-module layer adsorption, and the saturation adsorption capacity was 9.09 mg/g. When pH ranged from 4.1 to 8.5, the removal rate of As （Ⅲ） maintained above 70% , beyond this scope the removal rate decreased. When pH was about 6.8, the removal rate of As （Ⅲ ） using ferric hydroxide was the largest, that was 94.8%. With the temperature increasing, the removal rate of As （ Ⅲ ） was gradually reduced, the removal rate of As （Ⅲ） using ferric hydroxide remained above 80% at 0 to 25 ℃.
出处
《供水技术》
2010年第5期17-20,共4页
Water Technology
关键词
氢氧化铁
As(Ⅲ)
吸附
除砷
ferric hydroxide
As （Ⅲ）
adsorption
arsenic removal
