摘要
采用线性电位扫描法制备了水杨醛-Schiff碱基过渡金属镍络合物的聚合物poly[Ni(salen)],扫描速率为5-150 mV.s-1.采用场发射显微镜观察了聚合物poly[Ni(salen)]的表面形貌.研究了电聚合中扫描速率对聚合物生长的影响,电聚合速率(dГ/dm)与扫描速率(v)呈指数衰退关系,通过库仑电量分析指出电聚合扫描速率在20mV.s-1时聚合产物中含有最多的氧化还原活性点.扫描速率提高时单体的扩散步骤限制了聚合物的生长,所以氧化还原活性点总量随着扫描速率的提高而开始下降.利用循环伏安法分析了聚合物poly[Ni(salen)]的扩散动力学,结果表明在20 mV.s-1时制备的聚合物具有较大的电荷扩散系数.
Anodic electrochemical polymerization of N,N′-ethylenbis(salicylideneaminato) nickel(II)([Ni(salen)]) in tetrabutylammonium perchlorate(TBAP)/acetonitrile(AN) was investigated by the linear sweep potential method.The sweep rate ranged from 5 to 150 mV.s-1.The effect of sweep rate on the growth of poly[Ni(salen)] was studied by Coulomb analysis.The morphologies of poly[Ni(salen)] were characterized by field emission scanning electron microscopy(FESEM).The relationship between the growth rate of poly[Ni(salen)](dГ/dm) and the sweep rate(v) fits the exponential degradation equation.The content of the redox center for poly[Ni(salen)],grown at sweep rate of 20 mV.s-1,reaches a maximum and then decreases as the sweep rate increases because monomer diffusion restricts the growth of poly[Ni(salen)].We studied the effect of polymerization sweep rate on the kinetics of the as-grown poly[Ni(salen)] by cyclic voltammetry.The charge diffusion coefficient(D) of poly[Ni(salen)] grown at a sweep rate of 20 mV.s-1 was found to be the highest.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
2010年第10期2647-2652,共6页
Acta Physico-Chimica Sinica
基金
supported by the Natural Science Foundation of Beijing,China(2093039)
Program for New Century Excellent Talents in University,China~~
关键词
电化学聚合
希夫碱
过渡金属络合物
掺杂度
电荷扩散系数
Electropolymerization
Schiff base
Transition metal complex
Doping level
Charge diffusion coefficient