期刊文献+

多介质电容直接边界元计算及单介质计算加速 被引量:1

Calculating Capacitance with the Multiple Dielectrics Using the Direct BEM and Accelerating with Single Dielectric
下载PDF
导出
摘要 在VLSI电路中,版图设计的层次化、微细化及气泡结构等,使互连寄生电容器更为复杂。重点介绍在直接边界元法计算中,应用稀疏矩阵存储技术有效组织离散化方程组系数矩阵,以期快速、精确地进行多介质嵌套寄生电容的计算。同时,利用直接边界元法的局部化性质,以多介质的组织方式加速单介质计算,算例表明,加速可达一个数量级。 In the VLSI circuits, the parasitic interconnect capacitors become more complex with the development of multilevel metals, highly integrated density and complicated structures such as air gap etc. In this paper, it is presented that the capacitance of structure with embedded multiple dielectrics can be calculated rapidly and accurately by using stroage techniques of the sparse matrix in the direct BEM for efficiently management of the coefficient matrix of the discrete equations. Meanwhile, it is indicated that a character of localization of the direct BEM can be used to accelerate calculation of capacitance with single dielectric, which is treated as the virtual multiple dielectrics. The experimental results show that the speed up can reach one magnitude.
出处 《系统工程与电子技术》 EI CSCD 1999年第6期10-13,38,共5页 Systems Engineering and Electronics
关键词 电容 电路设计 边界元法 VLSI Direct BEM\ \ Embedded multiple dielectrics\ \ Accelerating calculating
  • 相关文献

参考文献5

  • 1吴启明,王泽毅.边界元素法在集成电路CAD中的应用[J].计算物理,1992,9(3):285-292. 被引量:14
  • 2布莱比来CA.工程师用的边界单元法[M].北京:科学出版社,1986..
  • 3吴启明,计算物理,1992年,9期,285页
  • 4李忠元,电磁场边界元素法,1987年
  • 5布莱比亚C A,工程实用边界单元法,1986年

二级参考文献1

  • 1Wang Z,IEEE Trans CAD

共引文献13

同被引文献4

引证文献1

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部