摘要
化学镀镍过程对PTCR及MLCC等元件的电性能,往往会产生负面效应,其中氢离子引起的还原作用不可忽视,其主要机理是增加了载流子浓度和改变了晶粒边界势垒。
Electroless nickel plating process often has a negative influence on the
electric properties of PTCR's, MLCC's, etc. When reduction reaction caused by hydrogen atoms
happens, the density of charge carriers increases and the grain boundary barrier changes. (4 refs.)
出处
《电子元件与材料》
CAS
CSCD
1999年第3期1-2,6,共3页
Electronic Components And Materials