摘要
可制造性设计技术使设计者尽早得到设计版图能否被制造的信息,以减少交流等待的时间。为此,提出一种可制造性模型,用一个或者多个卷积核描述设计版图和轮廓之间的关系,用最速下降法求得,求解过程仅需要输入版图和轮廓对。实验结果表明,该模型能够对设计版图的结果进行较好的预测,与通过光刻模型仿真结果之间的误差在1.8%以内。
Technologies of Design for Manufacturability（DfM） help IC designers to get the information of manufacturability of an IC design as early as possible to reduce turn-around-time.This paper proposes a new DfM model.One or more convolution kernels are used to describe the relationship between the pattern and contour.The modeling is solved by using steepest descent method,and only pairs of pattern and contour are needed.Experimental results show that the model can predict contour accurately with less than 1.8% differences to lithographic simulation result.
出处
《计算机工程》
CAS
CSCD
北大核心
2010年第20期225-228,共4页
Computer Engineering
关键词
可制造性设计
可制造性模型
仿光刻模型
Design for Manufacturability（DfM）
manufacturability model
litho-like model
