纳米三坐标测量机的误差分析与分离

Analysis and Separation of Nano-CMM Error

针对所研制的纳米三坐标测量机的具体结构,运用现代精度保障理论和技术,结合动、静力学相关知识,进行了纳米量级水平的误差源全面分析,对各误差的表现形式和影响进行了详细的描述,为后续的误差分配和结构优化设计打下基础。根据纳米坐标测量机的精确环境要求和所研制的纳米三坐标测量机结构、误差分布特征和精度要求,利用微型三光束平面干涉仪,设计了相关的支架组成了误差分离实验装置,实现标准量示值误差、导轨直线度线值误差和俯仰、偏摆和滚转误差的一次性分离,减小激光干涉仪发热、振动等外界环境因素对测量机误差的影响,同时避免了使用单一功能的仪器分次非实时测量带来的附加误差。实际分离实验结果验证了误差分离实验装置的有效性与可靠性。

According to the Nano-CMM structure,the nanometer level error source was analyzed by applying the modern accuracy theory and the dynamics and statics mechanics.The representation form and influence of various errors were described in detail,which was the basis of subsequent error distribution and structure optimization.Due to the requirements of the accurate circumstance,structure,error distribution character and precision requirement of the Nano-CMM,the error separating tool was constituted with the micro three light beam planar reflector laser interferometer and the correlative adjustable table,which realize the synchronous separation of the standard indicating error,the yaw,pitch and roll error of the guide strip and avoid the heat and vibration influence of interferometer to separation error.At the same time,the additive error created by the nonreal-time measurement of the single function instruments is avoided too.The validity and reliability of the facility is verified by the actual error separation result.