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W/Mo超晶格薄膜的微结构研究 被引量:4

A Study on the Microstructure of W/Mo Superlattice Thin Films
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摘要 纳米多层膜因常出现物理或力学性能的异常而成为薄膜研究的热点之一。采用XRD和TEM技术研究了W/Mo纳米多层膜微结构。结果表明,W和Mo由于同为体心立方结构,且晶格常数相近,由它们交互重叠形成的纳米多层膜具有柱状晶穿过调制界面外延生长的结构特征,形成多晶超晶格结构。 The research on the nano multilayer films has attracted wide attention because of their anormal properties in physics and mechanics The microstructure of the W/Mo nano multilayer film has been investigated by means of XRD and TEM in this paper It is shown that,due to W and Mo having the same BCC structure with approximately lattice constant,columnlar grains grow through modulaion interface in the way of epitaxy, forming polycrystal superlattice in the nano multilayer films
出处 《材料工程》 EI CAS CSCD 北大核心 1999年第3期24-27,共4页 Journal of Materials Engineering
关键词 纳米 多层膜 超晶格 磁控溅射 钨钼 XRD W/Mo nanomultilayers superlattice magnetron sputtering
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二级参考文献1

  • 1田民波,薄膜科学与技术手册,1991年,788页

共引文献8

同被引文献40

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