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Neutron radiation effect on 4H-SiC MESFETs and SBDs

Neutron radiation effect on 4H-SiC MESFETs and SBDs
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摘要 4H-SiC metal Schottky field effect transistors(MESFETs) and Schottky barrier diodes(SBDs) were irradiated at room temperature with 1 MeV neutrons.The highest neutron flux and gamma-ray total dose were 1×1015 n/cm2 and 3.3 Mrad(Si),respectively.After a neutron flux of 1×1013 n/cm2,the current characteristics of the MES-FET had only slightly changed,and the Schottky contacts of the gate contacts and the Ni,Ti/4H-SiC SBDs showed no obvious degradation.To further increase the neutron flux,the drain current of the SiC MESFET decreased and the threshold voltage increased.φB of the Schottky gate contact decreased when the neutron flux was more than or equal to 2.5×1014 n/cm2.SiC Schottky interface damage and radiation defects in the bulk material are mainly mechanisms for performance degradation of the experiment devices,and a high doping concentration of the active region will improve the neutron radiation tolerance. 4H-SiC metal Schottky field effect transistors(MESFETs) and Schottky barrier diodes(SBDs) were irradiated at room temperature with 1 MeV neutrons.The highest neutron flux and gamma-ray total dose were 1×1015 n/cm2 and 3.3 Mrad(Si),respectively.After a neutron flux of 1×1013 n/cm2,the current characteristics of the MES-FET had only slightly changed,and the Schottky contacts of the gate contacts and the Ni,Ti/4H-SiC SBDs showed no obvious degradation.To further increase the neutron flux,the drain current of the SiC MESFET decreased and the threshold voltage increased.φB of the Schottky gate contact decreased when the neutron flux was more than or equal to 2.5×1014 n/cm2.SiC Schottky interface damage and radiation defects in the bulk material are mainly mechanisms for performance degradation of the experiment devices,and a high doping concentration of the active region will improve the neutron radiation tolerance.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第11期29-32,共4页 半导体学报(英文版)
基金 Project supported by the National Natural Science Foundation of China(No.60606022) the Innovation Engineering of Shaanxi Province, China(No.2008ZDKG-30) the Advanced Research Foundation of China(No.9140A08050508) the Special Fund for Basic Scientific Research of Central Colleges,Chang'an University,China(No.CHD2010JC054)
关键词 silicon carbide metal semiconductor field effect transistor Schottky barrier diode neutron radiation silicon carbide; metal semiconductor field effect transistor; Schottky barrier diode; neutron radiation;
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