摘要
采用阴极电沉积的方法,用CdCl2的二甲基亚砜溶液做电解液在导电玻璃上制备了CdO薄膜.研究了沉积电流与电解液浓度对薄膜结构特性和电学性质的影响.XRD分析表明CdO薄膜为具有强的(200)晶面择优取向生长的立方结构,且随电流与沉积液浓度的变化,薄膜的(200)晶面择优取向程度发生了明显的变化.霍尔测试表明随着电解液浓度的升高,薄膜的面电阻增大.在较低的电解液浓度下薄膜的面电阻值最小为2.1×102Ω/sq..SEM显示CdO晶粒为球状颗粒,电解液浓度对CdO晶粒大小及膜的致密性有一定影响.
CdO crystal thin films with highly（200）-preferred orientation have been prepared by galvanostatic cathodic electrodeposition method from dimethyl sulfoxide solutions containing CdCl2 on transparent conductive glass substrates.The influence of deposition current and CdC2 concentration on the structural and electrical properties of the CdO films have been studied.
出处
《通化师范学院学报》
2010年第10期16-18,共3页
Journal of Tonghua Normal University
基金
通化师范学院自然科学科研项目(No.200927)
关键词
电沉积
CDO
XRD谱图
电学性质
electrodeposition
Cadmium oxide
XRD spectra
electrical properties
