大调制度表面正弦图形制作工艺研究

Investigation on the fabrication of sine shaped surface with large amplitude on the photoresist

表面起伏靶是惯性约束聚变（ＩＣＦ）分解实验中的重要实验用靶。为了得到调制深度大于１０μｍ光刻胶表面正弦图形，采用激光全息光刻的方法，固定曝光条件，同时保证曝光量足够，然后通过控制显影条件来实现起伏深度的变化。成功得到了调制深度分别为１５μｍ，２５μｍ，３５μｍ，周期分别为２０μｍ。

The surface perturbation target is one of the most important experimental targets for the resolved experiments of inertial confinement fusion (ICF). The preparation of sinemodulated perturbation figures with perturbation amplitude and periodicity of about several and tens of microns respectively with the method of holograph photolithography is reported. In the procedure of the fabrication, make the exposure conditions constant and control the amplitude by modulating the development conditions. The perturbation profiles of the figures are investigated by using an interference microscope and an optical microscope.