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微波等离子化学气相沉积金刚石膜新型微波谐振腔设计 被引量:3

Design of novel microwave cavity for MPCVD diamond film
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摘要 提出新型微波谐振腔用于化学气相沉积金刚石薄膜,腔体有效体积可以调节,采用环形介质窗口,置于沉积基台的下方,允许产生较大并且温度较高的等离子体。同轴内导体与沉积台相连接,微波从谐振腔底端传输经同轴导体耦合进入腔体。采用有限元的方法优化谐振腔的尺寸,使其能耦合进更大的微波能量,优化后,最大电场区域位于沉积台上方,并且均匀分布,在腔体内其它区域和介质窗口附近电场强度则很小,满足设计要求。采用时域有限差分法模拟了谐振腔在一定微波输入功率下产生等离子体的特性,并对设计的谐振腔进行试验研究,实验观察到的等离子体位置与模拟结果一致。 New microwave cavity for diamond film deposition was proposed in this paper,the effective volume of cavity can be adjusted,ring shape quartz window is located under the substrate holder,which is far from the plasma,allowing to generate plasma with high temperature.Inner conductor is connected with the substrate holder,microwave power enters the chamber from the bottom of the cavity.Numerical simulations were performed to optimize the geometry by finite element method(FEM),after optimization,the electric field in cavity exhibits one maximum and homogeneous distribution on substrate.Especially,it is very weak near the dielectric window,which satisfy the requirement of design.The calculation of the number density of electrons by finite difference time domain(FDTD)method,primary experiment was carried out,the shape and position of plasma are consistent with numerical prediction.
出处 《功能材料》 EI CAS CSCD 北大核心 2010年第11期1963-1965,1969,共4页 Journal of Functional Materials
基金 国家自然科学基金资助项目(10675017) 高等学校博士学科点专项科研基金资助项目(20060008013)
关键词 微波谐振腔 数值模拟 电场分布 金刚石薄膜沉积 microwave cavity numerical simulation electric field distribution diamond film deposition
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  • 1谢德馨,唐任远.计算电磁学近年来的若干重要成果——第15届COMPUMAG会议概述[J].电工技术学报,2005,20(9):1-6. 被引量:14
  • 2胡海天,邬钦崇,盛奕建.微波等离子体化学气相沉积金刚石膜[J].物理,1996,25(11):688-696. 被引量:8
  • 3Weiland T. On the unique numerical solution of maxwellian eigenvalue problems in three dimensions. Part. Accel,1985(17) : 227-230.
  • 4Weiland T. On the numerical solution of maxwell's equations and applications in the field of accelerator physics. Part. Accel,1984(15): 245-248.
  • 5MunPyo Hong, Emmert G A. Two-dimension fluid simulation of expanding plasma sheaths. J. Appl.Phys, 1995(78): 15-17.
  • 6Füner M ,Wild C,Koidl. Numerical simulations of microwave plasma reactors for diamond CVD. Surface and Coatings Technology, 1995(221): 74-75.
  • 7罗思 J R.工业等离子体工程[M].北京:科学出版社,1998.
  • 8Kobashi K, Nishimura K, et al. (110)-oriented Diamond Films Synthesized by Microwave Chemical-vapor Deposition[J]. Journal of Materials Research, 1990, 11 (5): 2469-2482.
  • 9Liou Y, Inspektor A, et al. The Effect of Oxygen in Diamond Deposition by Microwave Plasma Enhanced Chemical Vapor Deposition [ J ]. Journal of MateriaLs Research, 1990, 11(5 ) : 2305-2312.
  • 10Ong T P, Chang R P H. Low-temporature Deposition of Diamond Films for Optical Coatings[J].Applied Physics Letters, 1989, 55 (20) : 2063- 2065.

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