摘要
提出了一种高精度测量电子束曝光机束流的新方法。并给出测量电路，该电路在未加屏蔽的情况下，可达９０ｄＢ的共模抑制比。
A new technique tomeasure the current of electron beam of EBEM (Electron Beam Exposure Machine) with high Precision is Proposed. The circuit is described and its CMRR of 90dB is achieved without additional shielding.
出处
《微细加工技术》
1999年第2期8-11,共4页
Microfabrication Technology
