摘要
介绍了深紫外光刻技术、电子束光刻技术、Ｘ射线光刻技术以及与这些技术相关的一些单元技术的最新进展，概要介绍了这些技术最热门的研究课题，阐述了这些技术的发展前景。
Abstract The latest advances of deep UV microlithography,electron beam microlithography,X ray microlithography and some related unit techniques are presented in the paper.The most interested research items in these technologies and their developing prospects are described in brief.
出处
《光电工程》
CAS
CSCD
1999年第1期1-8,共8页
Opto-Electronic Engineering
