退火温度对NZFO铁氧体薄膜磁性能的影响(英文)

Effect of Annealing Temperature on Magnetic Properties of NZFO Films

采用化学溶液沉积法在Si(001)衬底上制备Ni0.7Zn0.3Fe2O4铁氧体薄膜,XRD谱表明样品具有单相的尖晶石结构;扫描电子显微镜结果表明样品平均颗粒尺寸随着退火温度的上升从10 nm增加到32 nm。NZFO铁氧体薄膜磁性能与退火温度有强烈的依赖关系,薄膜的矫顽力从退火温度为500℃时的25 Oe增加到900℃时的80 Oe,饱和磁化强度也由146emu/cm3增加到283 emu/cm3,这对于现代电子器件微型化有着非常重要的意义。

Nickel-zinc ferrite Ni0.7Zn0.3Fe2O4（NZFO） films were fabricated on Si（001） substrate by a simple chemical method.The microstructure and magnetic properties were systematically investigated.X-ray diffraction results show that all samples have a single-phase spinel structure.The results of field-emission scanning electronic microscopy show that the mean grain size increases from 10 to 32 nm with increasing the annealing temperature from 500 to 900 ℃.The magnetic properties of NZFO ferrite thin films exhibit a strong dependence on the annealing temperature.The coercivity increases from 25 to 80 Oe and the saturation magnetization increases from 146 to 283 emu/cm^3 with increasing the annealing temperature,which is in favor of modern electronic device miniaturization.