三价铬镀液电镀铬的工艺研究

Plating Process of Chromium from Trivalent Chromium Bath

研究了一种环保型的三价铬电镀工艺。讨论了电镀时间、pH、温度、搅拌方式以及阴极电流密度对镀层的影响。结果表明:镀层厚度增长随着电镀时间的延长呈现先快后慢的趋势;pH=3.5时可以获得厚度适中、外观光亮的镀层;镀层的光亮程度随着温度的升高而增加,45℃时最佳;不搅拌;该工艺的可操作电流密度较宽,Jκ在4～6 A/dm2。

An environmentally friendly chromium plating process from trivalent chromium solution was investigated.The effects of electroplating time,pH value,temperature,stirring methodic and cathodeic current density on the chromium coating were determined.The results showed that the thickness of chromium coating was increased with the electroplating time by a first-quick-then-slow down trend.A bright coating with a proper thickness could be obtained when the pH value was 3.5.The brightness of coating increased with increasing temperature,and reached to the maximum at temperature of 45℃ without stirring.This technique can be operated under a wider range of current density with the optimal condition of 4～6 A/dm2.