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Analysis of Nanometer Structure for Chromium Atoms in Gauss Standing Laser Wave 被引量:2

Analysis of Nanometer Structure for Chromium Atoms in Gauss Standing Laser Wave
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摘要 The equation of motion of two-level chromium atoms in Gauss standing laser wave is discussed and the distribution of chromium atoms is given under different transverse velocity conditions. The results show that the focusing position of atoms will be affected by the transverse velocity of atoms. Based on the four-order Runge- Kutta method, the locus of chromium atoms in Gauss standing laser wave is simulated. The three-dimensional characteristics of nanometer structures are stimulated under perfect and emanative conditions. The equation of motion of two-level chromium atoms in Gauss standing laser wave is discussed and the distribution of chromium atoms is given under different transverse velocity conditions. The results show that the focusing position of atoms will be affected by the transverse velocity of atoms. Based on the four-order Runge- Kutta method, the locus of chromium atoms in Gauss standing laser wave is simulated. The three-dimensional characteristics of nanometer structures are stimulated under perfect and emanative conditions.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2010年第12期54-56,共3页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant No 11064002.
关键词 Atomic and molecular physics Atomic and molecular physics
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  • 2张文涛,李同保.用于铬原子光刻的超高真空原子源的研制[J].激光与红外,2007,37(2):155-157. 被引量:1
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  • 4ROGER W, GOWAN M C. Light force cooling, manipulation, and nanometer-scale deposition of neutral aluminum atoms[ D]. Colorado State, USA : Colorado State University, 1996 : 189-201.
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  • 6TAN L. Study of dissipative force and laser cooling of a moving atoms [ D]. Lanzhou: Lanzhou Universitiy, 2003:59-62(in Chinese).
  • 7ZHANG W T, ZHU B H. Laser collimation of a chromium beam using doppler force[ J]. Chinese Journal of Physics, 2008, 46( 1 ) :63-72.
  • 8ZHANG W T, ZHU B H, XIONG X M, et al. A laser-cooled chromi- um atomic beam under 1 mrad for direct-write atom-lithography [ J ]. Nuclear Instruments and Methods in Physics, 2008, B266 ( 2 ) : 5171 - 5174.
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