期刊文献+

提高微结构表面在镀液中的润湿性 被引量:3

Improvement of the Surface Wettability of Microstructures in the Electrolyte
下载PDF
导出
摘要 为提高微结构在氨基磺酸镍镀液中的润湿性,研究了在该镀液中加入十二烷基硫酸钠(SDS)作为润湿剂和对微结构表面进行氧等离子体改性这两种方法的效果。测试了4种含不同SDS浓度的氨基磺酸镍镀液的极化曲线。运用傅里叶变化红外光谱分析(FTIR),对不同改性时间下的光刻胶表面成分进行了表征。提出了一种表征微结构润湿情况的方法。实验证明,添加SDS不影响镍在氨基磺酸镍溶液中的析出电位。FTIR的测试结果表明,通过氧等离子体改性在光刻胶表面引入了亲水的羟基,从而增强了由光刻胶构造的微结构的润湿性。研究发现,深宽比为1、线宽为50μm的微结构阵列经过氧等离子体改性5s后,在15min之内可被含SDS0.5kg/m3的氨基磺酸镍镀液完全浸润。 The sodium dodecyl sulfate (SDS) as a wetter and O2 plasma modification was investigated to enhance the wettability of microstructures in the nickel sulfamate electrolyte. The polarization curves of the nickel sulfamate electrolytes with different SDS concentrations were tested. The surface ingredients of photoresist were characterized during different modification time periods by Fourier transform infrared spectroscopy (FTIR). A new method was proposed to characterize the wettability of the microstructure. The experiment proves that the nickel deposition potential cannot be changed by the addition of SDS. According to the result of FTIR, the hydroxyl is introduced in the photoresist by O2 plasma modification to enhance the wettability of microstrueture. The result shows that the microstructure array with the width of 50 μm and the depth to width ratio of 1 is exposed to O2 plasma modification for 5 s, and is completely infiltrated within 15 min by nickel sulfamate electrolyte with 0.5 kg/m^3 SDS.
出处 《微纳电子技术》 CAS 北大核心 2010年第11期708-712,717,共6页 Micronanoelectronic Technology
基金 国家重点实验室基金资助项目(9140C79030302090C79) 上海市科委科研计划项目(0852nm02600)
关键词 光刻胶 表面改性 接触角 润湿性 微结构 photoresist surface modification contact angle wettability
  • 相关文献

参考文献12

  • 1胡洋洋,朱荻,李寒松,曲宁松,曾永彬,明平美.UV-LIGA制作超高微细阵列电极技术[J].光学精密工程,2010,18(3):670-676. 被引量:11
  • 2黄新龙,熊瑛,陈光焱,田扬超,刘刚.UV-LIGA技术制作微型螺旋形加速度开关[J].光学精密工程,2010,18(5):1152-1158. 被引量:14
  • 3WEIZJ, WANGYY, WANCC, etal. Study of wetters in nickel electroforming of 3D microstructures[J]. Materials Chemistry and Physics, 2000, 63: 235-239.
  • 4李海江,王守国,赵玲利,叶甜春.常压射频低温冷等离子体清洗光刻胶研究[J].半导体技术,2004,29(12):26-29. 被引量:4
  • 5袁媛,马元辉,尹民,刘昌胜,谢小波,朱瑞瑞.低频RF-等离子体处理对医用不锈钢表面润湿性能的影响[J].华东理工大学学报(自然科学版),2005,31(4):460-465. 被引量:5
  • 6冯瑞乾.印刷原理及工艺[M].北京:印刷工业出版社,2007.
  • 7WENZEL R N. Resistance of solid surfaces to wetting by water [J]. Industrial Engineering Chemistry, 1936, 28 (8): 988 - 994.
  • 8CASSIE A B D. Contact angle hysteresis on heterogeneous surfaces [J]. Discussions of the Faraday Society, 1948, 3:11 - 16.
  • 9CHUNG C K, HONG Y Z. Surface modification of SU8 photoresist for shrinkage improvement in a monolithic MEMS microstructure [J]. J Micromech Mieroeng, 2007, 17 (2):207 - 212.
  • 10LEONHARDT D, MURATORE C, WALTON S G, et al. Generation of electron-beam produced plasmas and applica tions to surface modification [J].Surface and Coatings Tech nology, 2004, 177/178: 682-687.

二级参考文献61

共引文献53

同被引文献30

引证文献3

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部