摘要
采用射频磁控溅射法在玻璃基片上沉积了TiNx/Ag/TiNx低辐射膜,研究了制备工艺参数对低辐射膜光学性能的影响以及低辐射膜的耐腐蚀性能。结果表明,TiNx薄膜可对膜系起到很好的保护作用,当膜系的TiNx保护层厚度为32nm、内层TiNx膜厚为16nm(氮气流量为55sccm)、Ag层厚度为16nm时,制备的低辐射膜系具有优良的透过率、低辐射性能和耐腐蚀性能。
TiNx/Ag/TiNx low-e films are deposited on glass slides by magnetron sputtering. The influence of deposition parameters on the optical property and the corrosion resistance property of the low-e films are investigated. The experiment results indicate that when the thickness of the surface TiNx film, which is a good protective film from damage of corrosion, is 32nm, the inner film is 16nm（the N2 mass flow rate is 55seem） ,and the Ag film is also 16nm, the low-e film presents a very good corrosion-resistance and optical property.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2010年第22期87-91,共5页
Materials Reports
基金
科技部863计划项目(2008AA031101)
