无掩膜流动刻蚀技术研究

Study on flow etching method without mask

为了实现玻璃材料高深宽比微结构的加工,提出了一种基于微尺度下流体分层流动现象的微流道内无掩膜流动刻蚀方法。通过对玻璃基体材料进行大量的工艺实验,明确了流动参数对于刻蚀成型微结构深宽比、侧壁形状、刻蚀速率的影响。证明了可以通过改变刻蚀剂与隔离剂的流动参数实现对成型微结构形貌的控制。实验结果表明约束流动刻蚀工艺可以在玻璃基体材料上加工出形态复杂、大深宽比的微结构,微结构的形貌取决于微流道中流体的流速。本实验的结果对于微尺度下分层流动的特性研究有一定的参考价值,并可为解决各向同性材料的微结构加工难题提供有效的解决方案。

To pattern micro structures with high aspect ratio on glass substrate,a micro fabrication method based on the laminar characteristics of microscale flow was introduced.Experiments on the flow parameters＇ effects on aspect ratios,side wall profile and etching rates were carried out based on the glass substrate.The experimental results reveal that the topography of micro structures patterned with restricted flow etching method is mainly determined by the flowrate of the separant and etchant.The method depicted in this research indicate that restricted flowing etching method can be used to pattern complex micro structures with high aspect ratio,and the topography is mainly depended on the flowrate of the stream and the shape and molecule diffusion of the interface.The conclusions are quite helpful for the research on micorscale laminar flow,and provide useful reference for the microfabricaiotn on isotropy materials.