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金刚石膜超高速抛光的模态分析 被引量:1

Modal analysis of ultra-high speed polishing of diamond films
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摘要 本文建立了金刚石膜抛光装置的实体模型,运用大型有限元分析软件ANSYS分别对抛光盘在三种不同工况下的振动特性进行分析,得出了相应的固有频率及振型。结果表明:金刚石膜抛光盘由低阶到高阶的振型是遵循一定的规律变化,边界条件对抛光盘模态参数有一定的影响。工作模态与约束模态二者的模态参数基本相同,相对振幅大的区域出现在抛光盘盘体上,且高阶固有频率对金刚石膜抛光盘的振动影响较大。该结论为金刚石膜超高速抛光机的性能评价和实际操作提供了可靠的理论依据。 In this paper,a solid assembly model of the polishing device of diamond films was built.The vibration properties of the polishing plate were analyzed by the software ANSYS under three different working conditions.The corresponding natural frequency and mode of vibration of the polishing plate were obtained.The results indicated that the mode of vibration varied from the low order to the high order in a certain law and the boundary conditions influenced the modal parameters of the polishing plate.The operation modal and the constraint modal had almost the same modal parameters.The relatively larger amplitude appeared in the body of the polishing plate,and the natural frequency of higher order showed more influence on vibration of the polishing plate.The results obtained from this paper provide a theoretical guidance for the characteristic valuation and operation of the ultra-high speed polishing device.
出处 《金刚石与磨料磨具工程》 CAS 北大核心 2010年第5期6-10,共5页 Diamond & Abrasives Engineering
基金 国家自然科学基金资助项目(No50675142) 辽宁省科技攻关计划项目(2004220017)
关键词 抛光盘 模态分析 固有频率 振型 polishing plate modal analysis natural frequency mode of vibration
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参考文献8

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