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基于ELID磨削WC-Co硬质合金表面机械研抛研究 被引量:3

The mechanical polishing research on the surface of WC-Co cemented carbide based on electrolytic in-process ( ELID) grinding
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摘要 本文采用ELID磨削和机械研磨抛光复合技术,对WC-Co硬质合金表面进行了超精密加工实验研究。首先采用ELID磨削对WC-Co硬质合金表面进行预加工,获得表面粗糙度Ra18 nm的精密加工表面。在此基础上对其进行机械研磨抛光加工,研抛盘转速设定为150~200 r/min,研抛压力控制在0.2~0.5 N/cm2范围;机械研抛时,首先采用含W1金刚石磨粒的研抛液,对ELID磨削后的表面进行加工100min左右,以达到快速去除的目的。再用含W0.5金刚石磨粒的研抛液,进行机械研抛约100 min,最后获得Ra4 nm的超精密表面。同时,针对机械研磨抛光过程,本文深入研究了磨料种类、粒度、抛光液溶剂、研抛压力、研抛加工时间等因素对加工表面粗糙度的影响。 In this paper,a composite technique of ELID grinding and mechanical polishing is used for ultraprecision machining experimental research.First,ELID grinding is adopted to pre-process the surface of WC-Co cemented carbide,obtaining the precision machined surface Ra18 nm,then the mechanical polishing process is implemented.When conducting mechanical polishing,the speed of the turntable is set to 150~200 r/min,and the polishing pressure is controlled in 0.2~0.5 N/cm2,the polishing liquid containing W1 diamond grits is used to process the surface for about 100 minutes,aiming to achieve a rapid removal.Then using the polishing liquid containing W0.5 diamond grits for another 100 minutes,an ultra-precision surface Ra 4 nm is obtained by the mechanical polishing method.Meanwhile,the influence factors of the surface roughness during mechanical polishing process were tested,such as abrasive type,grain size,polishing liquid solvents,polishing pressure,polishing time,etc.
出处 《金刚石与磨料磨具工程》 CAS 北大核心 2010年第5期11-14,20,共5页 Diamond & Abrasives Engineering
基金 国家自然科技基金委员会-中国工程物理研究院联合基金资助项目(10676001)
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