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晶体管发射极电流集边效应物理意义之探讨 被引量:7

Discussion on the Physical Meaning of the Edge Crowding Effect of Emitter Current in a Transistor
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摘要 由基区电阻的自偏压引起的晶体管发射极电流集边效应,是限制晶体管承载电流能力的因素之一[1~4]。本文以发射极电流集边效应发生的程度,分为四个区域,详细探讨了归一化电位和电流密度分布的特点,指出:在Ⅰ~Ⅱ区,发射极电流集边效应不明显,晶体管承载电流能力主要由发射区面积决定;在Ⅰ~Ⅲ区,发射极电流集边效应明显,晶体管承载电流能力由发射区面积和发射区有效周长共同决定;在Ⅰ~Ⅳ区发射极电流集边效应已非常突出,晶体管承载电流能力由发射区有效周长决定。 The edge crowding effect of emitter current in a transistor caused by self bias of base resistor is one of the factors to limit its capability of loaded current.It is discussed in details in the paper that there are four regions depending upon the case occurred in the edge crowding effect of emitter current,The distributions and normalized voltage and current density,and their characters are discussed in this paper.It is pointed out that in region(Ⅰ~Ⅱ),the effect is not distinguished,its capability of loaded current is almost depending upon the area of emitter.Inregion(Ⅰ~Ⅲ),the effect is distinguished,the capability of loaded current is depending upon the area of emitter and its effctive peripheral length.In region(Ⅰ~Ⅳ),the effect is tremendous distinguished,the capability of loaded current is depending upon the effective peripheral length of emitter only.
作者 石林初
出处 《半导体技术》 CAS CSCD 北大核心 1999年第3期14-18,共5页 Semiconductor Technology
基金 国家自然科学基金
关键词 晶体管 发射极 电流集边效应 Principle of transistor Edge crouding effect of emitter current Base resistor Effective peripheral length of emitter Effective width of emitter
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参考文献9

  • 1张屏英 周佑汉.晶体管原理[M].上海:上海科学出版社,1984..
  • 2石林初.关于发射极电流集边效应微分方程的精确解[J].江南半导体通讯,1988,(3):38-38.
  • 3陈星弼 唐茂成.晶体管原理[M].国防工业出版社,1982..
  • 4石林初.电阻网络元模拟算法及其在IC设计中的应用[J].半导体技术,1999,24(2):20-23. 被引量:2
  • 5Shi L C,ICMPC,1991年
  • 6石林初,江南半导体通讯,1988年,3期,38页
  • 7张屏英,晶体管原理,1984年
  • 8陈星弼,晶体管原理,1982年
  • 9宋南辛,晶体管原理,1980年,210页

二级参考文献3

  • 1小沃纳R M 福登沃尔特J N.集成电路--设计原理与制造[M].上海:上海科学技术情报研究所出版,1970.131.
  • 2张屏英 周佑谟.晶体管理原理[M].上海:上海科学技术出版社,1986.87.
  • 3张屏英,晶体管原理,1986年,87页

共引文献7

同被引文献24

  • 1杨银堂,朱海刚.BCD集成电路技术的研究与进展[J].微电子学,2006,36(3):315-319. 被引量:13
  • 2张屏英 周佑汉.晶体管原理[M].上海:上海科学出版社,1984..
  • 3石林初.关于发射极电流集边效应微分方程的精确解[J].江南半导体通讯,1988,(3):38-38.
  • 4宋清辛 徐义刚.晶体管原理[M].,1980.210-214.
  • 5Liu W,Khatibzadeh A.The collapse of current gain in multi-finger heterojunction bipolar transistors:its substrate temperature dependence,instability criteria,and modeling.IEEE Trans Electron Devices,1994,41(10):1698
  • 6Gao G B,Unlu M S,Morkoc H,et al.Emitter ballasting resistor design for,and current handling capacity of AlGaAs/GaAs power heterojunction bipolar transistors.IEEE Trans Electron Devices,1991,38(2):185
  • 7Chen Mary,Nguyen Chanh,Liu Takyiu.High-performanceAlInAs/GaInAs/InP DHBT X-band power cell with InP emitter ballast resistor.Proceedings:IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits,1995:573
  • 8Liu W,Harris J S Jr.Dependence of base crowding effect onbase doping and thickness for npn AlGaAs/GaAs HBTs.Electronics Lett,1991,27(22):2048
  • 9Ohl R S. Light sensitive electric device [P]. US Patent, 2443542, filed 27, 1941-05.
  • 10Zhao J, Green M A. Optimized antireflection coatings for high efficiency silicon solar cells[J]. IEEE Transactions on Electron Devices, 1991, 38(8): 1925- 1934.

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