摘要
详述了目前用于深亚微米CMOSIC的静电放电(ESD)保护方法,比较了它们各自的特点,并详细阐述了栅耦合PMOS触发/NMOS触发横向可控硅(PTLSCR/NTLSCR)ESD保护电路的工作原理。
Several electrostatic discharge protection methods used in deep submic ron CMOS IC have been discussed.Their own features are compared.And the operating principle of a gate coupled PMOS triggered/NMOS triggered lateral silicon rectifier ESD circuit is described in details.
出处
《半导体技术》
CAS
CSCD
北大核心
1999年第3期45-49,共5页
Semiconductor Technology