摘要
本文介绍了采用离子交换技术制作表面传导电子发射源的原理和方法,应用离子交换技术制作了发射材料为金属Pd的表面传导电子发射源。分别研究了加电形成工序和激活工序中器件电流、发射电流随器件电压的变化规律,测试了电子发射性能,结果表明:发射电流存在阈值电压,即在器件电流达到最大值时的器件电压;最大发射效率有一个电压区间,在这个电压区间内,器件电流处于最低平台阶段,而发射电流达到稳定高电流阶段。
We addressed the fabrication of sttrface-conduction emitter for the development of the surface-conduction emitter display (SED) by using ion exchange technology. The SED electron emission source was made of palladium. The impacts of the emitter fabrication processes, such as y, sintering, activation of the conduction films, etc., on its field emission characteristics were studied. The relationship between the emission current and the device voltage were ex- perimentally evaluated. The results show that a threshold voltage can be found to correlate with the emission current, within which the emission efficiency maximizes with steady peak emission current and the device current remains at the lower step.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2010年第6期577-581,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家高技术研究发展专项经费资助(2009AA03Z307)
关键词
SED
光刻
离子交换
电子发射
SED, Photoetching, Ion exchange, Electron emission