摘要
利用变频导纳谱研究了γ辐照前后Hg1-xCdxTe(x=06)n+onp结中的深能级缺陷.辐照前其缺陷能级位置在价带上015eV,俘获截面σp=29×10-18cm2,缺陷密度Nt=65×1015cm-3,初步认为是Hg空位或与其相关的复合缺陷;经过104Gy的γ辐照后其能级变得更深,在价带上019eV,同时其俘获截面增加了近一个数量级,而缺陷密度基本上没有变化.γ辐照引入的这种能级变化最终使器件的性能(探测率)下降了1/2以上.
Abstract Admittance Spectroscopy (AS) measurements have been
performed on n + on p Hg 1-x Cd x Te( x =0.6) photodiodes.Before gamma irradiation,a
deep level located 0.15eV above the valence band is observed,its trap density N t=4.8×10
15 cm -3 with the capture cross section of approximately 2.2×10 -17 cm 2,which is
probablely induced by a compound defect correlated with Hg vacancy.After 10 4Gy gamma
irradiation,a new trap center located 0.19eV above the valence band is found,and the pre
irradiation trap level 0.15eV above the valence band is no longer seen.The trap densities for
these two levels are almost the same.This defect level change ultimately makes the device
performance deteriorated.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1999年第6期1107-1112,共6页
Acta Physica Sinica
基金
国防科技预研基金
国家自然科学基金