圆盘反应器内流动和成膜性能的数值模拟

Numerical simulation of the flow and film-forming characteristics in a horizontal rotating disk reactor

采用流体体积函数法(VOF)对卧式旋转圆盘反应器的流动和成膜特性进行了数值模拟,并考察了圆盘转速和反应器内液位高度对液膜厚度及分布的影响规律。研究结果表明,VOF方法能够较好的模拟圆盘反应器内液膜的流动和成膜特性,反应器内液相流场、成膜过程、液膜厚度及分布的模拟数据与实验结果吻合良好;液膜厚度随圆盘转速增加而增大,液位高度的变化对其影响不大;圆盘成膜具有最低转速和最低液位;同时模拟得到了圆盘表面液膜的分布规律。

The flow and film-forming characteristics in a horizontal rotating disk reactor have been numerically simulated by using the volume of fluid （VOF） model and were validated using experimental data from the literature. The effects of varying the rotation speed and liquid height on the thickness and distribution of the film thickness were also investigated. The results showed that the liquid flow field,the film-forming process,the thickness,and distribution of the film thickness predicted by the VOF model are in good agreement with the experimental data. The thickness of the film increased as the rotation speed was increased,whereas the height of the liquid had little influence on the thickness of the film. A minimum rotation speed and liquid height were founf to be required for film formation. The distribution of the film on the surface of the disk was also obtained. The results are of importance for the design and optimization of rotating disk reactors.