二维纳米光栅国际比对结果

Results from National Institute of Metrology in NANO5 2D Grating Comparison

随着纳米研究和纳米加工技术的发展,国际上越来越重视对纳米测量的有效性和溯源性。国际计量局(BIPM)尺度计量长度工作组(CCL-WGDM)长度咨询委员会先后提出并组织了5次纳米标准样板(NANO1～NANO5)的国际比对。NANO5比对是由丹麦基础计量技术研究院(DFM)主导的。该比对是从2005年1月开始,历时1年多结束。标准样板在12个国家计量研究院所间相互循环校准,形成三个有序的环。主导实验室DFM对比对数据进行了处理,其结果已于2008年7月底公布。比对结果证明中国计量科学研究院的纳米光栅测量装置与国际同行保持同等水平。

With the development of nano-reseach and nano-manufacture,the validity and traceability have been emphasized around the world.the Discussion Group 7 （DG7） for Nanometrology under the Consultative Committee for Length＇s Working Group on Dimensional Metrology （CCL-WGDM） of the Bureau International des Poids et Mesures （BIPM ） has presented and organized 5 international comparisons for nano-samples （NANO1~NANO5）.The comparison was dominated by Danish Fundamental Metrology （DFM）.The comparison began in January 2005 and lasted for more than one year.The standard sample was transferred in 12 countries to carry out in three sequential loops.The comparison data were processed by DFM and the results were announced in July 2008.The results prove that the equipment for measuring grating pitch of NIM is accordance with the international nanometrology measurement level.