Ni-Mo电沉积层的组成和结构

Analysis on Structure of Electrodeposited Ni Mo Alloy

利用Ｘ射线光电子谱（ＸＰＳ）研究了Ｎｉ－Ｍｏ沉积层的组成元素及其价态和深度分布，用扫描电子显微镜（ＳＥＭ）、Ｘ射线衍射技术（ＸＲＤ）和电子探针显微分析技术（ＥＰＭＡ）研究了电沉积Ｎｉ－Ｍｏ合金层的形貌、结晶状态、组成元素分布情况。结果表明，电沉积Ｎｉ－Ｍｏ合金层呈现亮色，表面比较均匀。电沉积层为非晶结构，２θ在４０°～５０°间有一弥散对称峰。沉积层中的Ｎｉ和Ｍｏ为零价态，它们的结合能分别为８５２．８ｅＶ和２２８．２ｅＶ。沉积层的真实组成（相对原子百分浓度）为：Ｎｉ５０．８６％，Ｍｏ２２．６３％，Ｏ２６．５１％。

Composition elements in the electrodeposited Ni Mo alloy, their valence state and their composition changes in the depth direction are investigated by XPS spectra on copper substrate. Morphology, crystal state and the composed elements distribution of the electrodeposited Ni Mo alloy are also studied by SEM, XRD and EPMA. The results show that the electrodeposited alloy looks like bright, the composed elements are well distributed, the Ni Mo alloy is amorphous. There is a broadened symmetry peak where 2 θ is between 40 degree and 50 degree. Elements Ni and Mo in the electrodeposited alloy are in form of zero valence, and their binding energy are 852.8 eV and 228.2 eV respectively. The real composition of electrodeposited Ni Mo alloy, that is, their relative atomic percent concentration is of 50.86%Ni, 22.63% Mo and 26.51% O.