将硅片干法刻蚀技术引入设计性、研究性的普通物理实验

Bringing the Dry Etching Technique of Silicon into the Designed and Investigative General Physics Experiment

对硅的干法刻蚀技术是现代半导体工业中非常重要的一项工艺。本文介绍了如何将硅片干法刻蚀技术引入到设计性、研究性的普通物理实验教学中.以及在相关实验教学的设计、实验内容的编排和教学方式等方面的一些特点。

Dry etching technique of silicon is a very important process in the modem semiconductor industry. This article describes how to bring the dry etching technique of silicon into the designed and investigative physics experiment teaching, and some features of the layout of teaching design and content of relevant experiment, as well as the ways of teaching.