摘要
Platinum films were sputter-deposited on two groups of nickel alloy substrates, in which the first group was the samples with rough surface, and the other group with polished surface. The platinum thin-films were applied to serve as the low-emissivity layers to reflect thermal radiation. Then, the platinum-coated samples were heated in air at 600 ℃ for 200 h to explore the effect of high-temperature environment on the emissivity of coated platinum film. After annealing, the average IR emissivity （at the wavelength of 3-14 μm） of the platinum film was only about 0.1 for polished sample and 0.45 for rough sample. The diffusion between platinum and the nickelalloy elements at 600 ℃ had been also discussed.
Platinum films were sputter-deposited on two groups of nickel alloy substrates, in which the first group was the samples with rough surface, and the other group with polished surface. The platinum thin-films were applied to serve as the low-emissivity layers to reflect thermal radiation. Then, the platinum-coated samples were heated in air at 600 ℃ for 200 h to explore the effect of high-temperature environment on the emissivity of coated platinum film. After annealing, the average IR emissivity （at the wavelength of 3-14 μm） of the platinum film was only about 0.1 for polished sample and 0.45 for rough sample. The diffusion between platinum and the nickelalloy elements at 600 ℃ had been also discussed.
基金
supported by the fund of the State Key Laboratory of Solidification Processing in NWPU, NoKP200901
