纯铌表面多孔Nb_2O_5薄膜的制备

Synthesis of Porous niobium oxide film on the surface of pure niobium

采用恒压阳极氧化法在室温下制备了多孔Nb_2O_5薄膜,研究了电解液种类和氧化电压对纯铌表面形成Nb_2O_5多孔薄膜形貌的影响。结果表明,以H2S04/HF为电解液得到了20～30 nm孔道大小,排列较为规则的多孔薄膜,而以H_3PO_4HF为电解液,阳极氧化1 h形成了沟状相连的多孔结构,这是由于孔壁被刻蚀,表面多孔结构被破坏所致。研究了在磷酸电解液中不同阳极氧化电压对薄膜形貌的影响。随着电压的增加,纯铌表面逐渐形成纳米多孔结构,并最终在表面形成锥状形貌的氧化物。

Porous niobium oxide film is prepared by anodization of niobium foils in two electrolyte,respectively.The effects of the electrolytes,anodic potential on the preparation of porous niobium oxide are investigated.In the H3PO4/HF electrolyte,the porous niobium oxide film with diameters of 20 nm to 30 nm and thickness ranging from about 780 nm was obtained under 15 V for 1h.In H2SO4/HF electrolyte under 20 V for 1h,the porous Nb2O5 layers consist of ordered pore arrays with pore diameters of 20 nm and thickness about 300 nm.Pore morphology strongly depends on the anodizing potential.