采用磁控管方式溅射的电子回旋共振等离子体沉积技术的研究

Study of an Electron Cyclotron Resonance Plasma Deposition Technique by Magnetron Mode Sputtering

将磁控管方式溅射用于微波ＥＣＲ等离子体沉积技术。在低气压和低温下沉积了高度Ｃ轴取向的ＺｎＯ薄膜，其膜的沉积速率比普通ＥＣＲ溅射中所得到的速率大得多，并且在Φ１２ｃｍ的膜区域内显示出良好的均匀性。

Magnetron mode sputtering was applied to an electron cyclotron resonance (ECR) plasma deposition technique,ZnO film with an excellent crystal orientation was deposited at low temperatures and low gas pressures,with much higher rates than those obtained in conventional ECR reactive sputtering and good uniformity of deposition film in Φ 12cm.