193nm光学掩模与x射线掩模技术比较

Technology Comparison Between 193nm Photomask and X Ray Mask

目前看来，１９３ｎｍ与ｘ射线光刻技术都很有希望应用到０．１３μｍ及０．１３μｍ以下的集成电路工业中去，而掩模制作对这两种光刻技术而言是非常重要的。本文对１９３ｎｍ光学掩模与ｘ射线掩模制造技术进行了对比分析。

At present,both 193nm optical and x ray lithography are main candidates for the manufacture of 0 13μm integrated circuits and below.The fabrication of mask is very important to these two lithography methods.In this paper,the fabrication technology of both 193nm optical reticle and x ray mask is compared.