摘要
介绍了等离子体选址液晶显示的研发历史、主要特点、基本原理和制 造工艺，对其中一些关键技术和问题进行了讨论，最后分析了其应用市场。
The R & D history, main properties,principle and fabrication process of PALCD are discribed, and some of the key technologies and problems of PALCD are discussed as well. The application and market are analyzed in the end of the paper.
出处
《光电子技术》
CAS
1999年第1期31-40,共10页
Optoelectronic Technology
