期刊文献+

金属微结构电铸成型的流场性能研究

Research on Flow Field Character of Micro Electroforming of Metallic Microstructure
下载PDF
导出
摘要 为改善高深宽比金属微结构的电铸成型质量,在分析微细电铸的流场特性的基础上,深入研究了铸层厚度的不均匀现象及搅拌方式、流场分布对微细电铸的影响。由于高深宽比胶膜的存在,单一搅拌对电铸区域的影响只集中在微区的入口部分。扩散过程成为金属沉积的限制性因素;随着胶膜深宽比的增大,搅拌速度对电铸传质过程影响减小,导致电铸微区内金属离子传输能力不均匀。实验表明,微细电铸过程中,搅拌速度提高并不能改善金属沉积的传质条件;辅助超声的复合搅拌在相同条件下能提高金属沉积速度、减少铸层缺陷、改善传质。实现了高分辨率,侧壁陡直的金属微结构的电铸成型。 To improve the micro electroforming quality of the microstructure with large high aspect ratio,the characteristics of the micro electroforming process and the property of the flow field were analyzed and discussed systematically.The asymmetry phenomena of the deposit and the effect of the stirring mode,flow field on the microstructure were studied in detail.Experiment showed that the effect of the pure stirring concentrated on the entrance of the micro groove only.Diffusion was the control factors of micro electroforming process.The effect influencing on the mass transferring reduced with the increasing high aspect ratio of the deposit,which resulting in the discrepancy of ion transferring capacity in the reaction area.The results also showed that the stirring velocity could not improve transferring condition,while complex stirring with auxiliary ultrasonic could help to increase the deposit velocity and get the perfect microstructure.Based on the research on the flow field,high resolute electroforming microstructure with vertical wall was fabricated.
出处 《压电与声光》 CSCD 北大核心 2010年第6期1005-1008,共4页 Piezoelectrics & Acoustooptics
基金 江苏省高校自然科学重大基础研究基金资助项目(09KJA460001)
关键词 微细电铸 微结构 流场 仿真 micro electroforming microstructure flow field simulation
  • 相关文献

参考文献11

  • 1杜立群,朱神渺,刘冲.UV-LIGA工艺中SU-8光刻胶的热溶胀性研究[J].压电与声光,2008,30(5):621-623. 被引量:5
  • 2李永海,丁桂甫,毛海平,张永华.LIGA/准LIGA技术微电铸工艺研究进展[J].电子工艺技术,2005,26(1):1-5. 被引量:20
  • 3NILSON R H, GRIFFITHS S K. Enhanced transport by acoustic St reaming in deep trench-like cavities[J]. Journal of the Electro chemical Society, 2002, 149(4) : 286-296.
  • 4XIA C M. Simulation of electrodeposition in ultra-deep- mieroeavities[D]. Pittsburgh Pennsylvania: Carnegie Mellon University, 2001.
  • 5NARASIMHAN B, PEPPAS N A. The physics of polymer dissolution: modeling approaches and experimental behavior[J]. Advances in Polymer Sciences, 1997, 128(10): 157-207.
  • 6郑晓虎,朱荻.模糊神经网络在UV-LIGA工艺优化中的应用[J].光学精密工程,2006,14(1):139-144. 被引量:17
  • 7JENSEN J A D, POCWIARDOWSKI P, PERSSON P O, et al. Acoustic St reaming enhanced elect rodeposition of nickel[J]. Chemical Physics Letters, 2003, 368 (5):732-737.
  • 8BADE K, LEYENDECKER K, THOMMES A, et al. Electroplating at high aspect ratio micropatterned electrodes-influence of mass transfer proe fourth intl symposium on magnetic materials, processes, and devices[C]//Pennsylvania, USA: Electrochemical Society Fall Meeting, 1995: 121-135.
  • 9JORDAN K G, TOBIAS C W. Simulation of the role of convection in electrodeposition into microscopic trenches[J]. J Electrochem Soc, 1991, 138(7), 1933- 1939.
  • 10刘海军,杜立群,秦江,朱神渺.无背板生长工艺微电铸均匀性的实验研究[J].传感技术学报,2006,19(05A):1481-1483. 被引量:7

二级参考文献24

  • 1杨承,黄成军,刘锋,于军.毛细管电泳芯片制备工艺研究[J].华中科技大学学报(自然科学版),2004,32(7):92-94. 被引量:2
  • 2李永海,丁桂甫,毛海平,张永华.LIGA/准LIGA技术微电铸工艺研究进展[J].电子工艺技术,2005,26(1):1-5. 被引量:20
  • 3肖日松,杜立群,刘冲,刘海军,秦江.基于MEMS技术的微型模具制作工艺研究[J].高技术通讯,2006,16(4):368-371. 被引量:8
  • 4[3]XIA C M.Simulation of electrodeposition in ultra-deep microcavities[D].Pittsburgh Pennsylvania:Carnegie Mellon University,2001.
  • 5[4]NARASIMHAN B,PEPPAS N A.The physics of polymer dissolution:modeling approaches and experimental behavior[J].Advances in Polymer Sciences,1997,128:157-207.
  • 6[6]BADE K,LEYENDECKER K,THOMMES A,et al..Electroplating at high aspect ratio micropatterned electrodes-influence of mass transfer[C].Intl.Symposium on Magnetic Materials,Processes,and Devices,Pennsyl-vania,Electrochemical Society Fall Meeting,1995,4:121-135.
  • 7[7]JORDAN K G,TOBIAS C W.Simulation of the role of convection in electrodeposition into microscopic trenches[J].J.Electrochem.Soc.,1991,138(7):1933-1939.
  • 8KOO H,LIU K,TSENG F.Mechanical strength and interfacial failure analysis of cantilevered SU-8 microposts[J].Micromech.Microeng,2003,13:822-831.
  • 9ZHANG J,TAN L K,GONG Q H.Characterization of the polymerization of SU-8 photoresist and its application in micro-electro-mechanical systems[J].Polymer Testing,2001,20:693-701.
  • 10HONG S J,CHOI S K,CHOL Y S,et al.Characterization of low-temperature SU-8 photoresist processing for MEMS applications[C].2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.Hawaii,2004:404-408.

共引文献49

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部