工艺参数对磁控溅射TiN膜成分影响的研究

Growth Parameters and Surface Stoichiometery of TiN Films Grown by Magnetron Sputtering

在不同的工艺参数条件下 ,采用磁控溅射技术制备了大量的TiN膜样品。通过对实验结果的仔细分析 ,得出了膜层颜色与氩气分压无关 ,而与溅射功率和氮气分压的比值有关的结论 ,并得到了微观结构分析的证实。

TiN films grown by magnetron sputtering under different conditions were systematically studied with X ray Photoelectron spectroscopy.The results show that the color of the TiN films depends significantly on the ratio of nitrogen partial pressure and sputtering power but it is independent of argon partial pressure.